Substrate Processing Apparatus and Apparatus for Manufacturing Integrated Circuit Device

ABSTRACT

A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the benefit of Korean Patent Application No.10-2017-0071729, filed on Jun. 8, 2017, in the Korean IntellectualProperty Office, the disclosure of which is incorporated herein in itsentirety by reference.

BACKGROUND

The inventive concept relates to an integrated circuit device and amethod of manufacturing the integrated circuit device, and moreparticularly to a substrate processing apparatus and an apparatus formanufacturing an integrated circuit device, which use a supercriticalfluid.

As design rules of integrated circuit devices decrease, criticaldimensions of semiconductor devices are reduced to about 20 nm to about30 nm or less, and accordingly, a deep and narrow pattern formationprocess having a relatively high aspect ratio of about 5 or more and acleaning and drying process accompanied therewith may be used. Methodsusing a supercritical fluid have been proposed to perform apredetermined process such as etching, cleaning, or drying on asubstrate in which a structure having a high aspect ratio is formed inorder to manufacture a highly integrated circuit device. However, inconventional substrate processing apparatuses and methods using thesupercritical fluid, contaminants such as particles may be generated andremain in vessels of the substrate processing apparatuses using thesupercritical fluid, and the contaminants may be adsorbed on substratesagain and cause defects on the substrates.

SUMMARY

The inventive concept provides a substrate processing apparatus capableof preventing defects from being generated in a substrate due toparticles in a vessel during a drying process for the substrate and anapparatus for manufacturing an integrated circuit device, which includesthe substrate processing apparatus.

The inventive concept provides a substrate processing apparatus capableof improving the productivity of a substrate drying process, and anapparatus for manufacturing an integrated circuit device, which includesthe substrate processing apparatus.

According to an aspect of the inventive concept, provided is a substrateprocessing apparatus including: a vessel including a processing spacefor processing a substrate; a substrate support configured to supportthe substrate loaded in the processing space; and a barrier, between aside wall of the vessel and the substrate support, configured tosurround the substrate support.

According to another aspect of the inventive concept, provided is asubstrate processing apparatus including: at least one vessel includinga processing space configured to process a substrate, the at least onevessel including an upper vessel and a lower vessel moveably coupled toeach other so as to be openable and closable to switch between a closedposition for sealing the processing space and an open position foropening the processing space; a substrate support configured to supportthe substrate loaded in the processing space, wherein the substratesupport is coupled to an upper wall defining the processing space of theat least one vessel; a barrier between a side wall of the at least onevessel and the substrate support, wherein the barrier is coupled to theupper wall defining the processing space of the at least one vessel; andan exhaust port in a bottom wall of the at least one vessel opposite theupper wall and configured to discharge a fluid from inside the at leastone vessel, wherein the barrier extends downward along a direction ofthe side wall of the at least one vessel toward the bottom wall, andwherein a lowest portion of the barrier extends past a lowest portion ofthe substrate support from the upper wall when the vessel is in theclosed position.

According to another aspect of the inventive concept, provided is asubstrate processing apparatus including: a vessel including aprocessing space configured to process a substrate, wherein the vesselincludes an upper vessel and a lower vessel coupled to each other so asto be openable and closable to switch between a closed position to sealthe processing space and an open position to open the processing space;and a first protective layer on a contact portion where the upper vesseland the lower vessel are in contact each other in the closed positionand are separated from each other in the open position.

According to another aspect of the inventive concept, provided is anapparatus for manufacturing an integrated circuit device, wherein theapparatus includes: a cleaning unit configured to clean a substrate; anda drying unit including a drying chamber for drying the cleanedsubstrate, wherein the drying chamber includes: a vessel including aprocessing space configured to process the cleaned substrate, whereinthe vessel includes an upper vessel and a lower vessel coupled to eachother so as to be openable and closable to switch between a closedposition to seal the processing space and an open position to open theprocessing space; a substrate support configured to support thesubstrate loaded in the processing space, wherein the substrate supportis coupled to the upper vessel; a barrier coupled to the upper vessel tosurround an edge of the substrate supported by the substrate support;and a driving device configured to move at least one of the upper vesseland the lower vessel to the closed position or the open position.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the inventive concept will be more clearly understoodfrom the following detailed description taken in conjunction with theaccompanying drawings in which:

FIGS. 1A and 1B are cross-sectional views schematically showing asubstrate processing apparatus according to embodiments;

FIGS. 2 and 3 are cross-sectional views schematically showing substrateprocessing apparatuses according to embodiments;

FIG. 4 is a cross-sectional view schematically showing a substrateprocessing apparatus according to embodiments;

FIGS. 5 and 6 are cross-sectional views schematically showing substrateprocessing apparatuses according to embodiments, which show a portioncorresponding to a region A in FIG. 1A;

FIG. 7 is a diagram showing a stream along which a fluid is dischargedfrom a vessel in a closed position in a substrate processing apparatusaccording to some embodiments;

FIG. 8 is a diagram showing a stream of a supercritical fluid suppliedinto a vessel in a substrate processing apparatus according to someembodiments;

FIGS. 9 and 10 are views schematically showing substrate processingapparatuses according to some embodiments;

FIG. 11 is a plan view schematically showing an integrated circuitdevice manufacturing apparatus according to some embodiments;

FIG. 12 is a flowchart for explaining a substrate processing methodaccording to embodiments; and

FIG. 13 is a graph showing an example of pressure change in a processingspace of a vessel in an operation of drying a substrate of FIG. 12.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Hereinafter, embodiments of the inventive concept will be described indetail with reference to accompanying drawings.

FIGS. 1A and 1B are cross-sectional views schematically showing asubstrate processing apparatus 100 according to embodiments. Thesubstrate processing apparatus 100 illustrated in FIG. 1A corresponds toa case where a vessel 110 providing a processing space PS for processinga substrate W is in an open position for opening the processing space PSto the atmosphere, and the substrate processing apparatus 100illustrated in FIG. 1B may corresponds to a case where the vessel 110providing the processing space PS for processing the substrate W is in aclosed position for sealing the processing space PS.

Referring to FIGS. 1A and 1B, the substrate processing apparatus 100 mayinclude the vessel 110, a substrate support 130, a fluid supply unit140, an exhaust unit 141, a barrier 150, a blocking plate 160, and adriving device 170.

The vessel 110 may provide the processing space PS for processing thesubstrate W. For example, in the processing space PS, a drying processfor the substrate W, which uses a supercritical fluid, may be performed.The vessel 110 may include a material capable of withstanding a highpressure equal to or greater than a critical pressure.

The supercritical fluid has physical properties such as density,viscosity, diffusion coefficient and polarity, which continuously varyfrom a gas-like state to a liquid-like state depending on a change inpressure. For example, when liquid carbon dioxide is placed in a sealedcontainer and heated, the interface between gas and liquid may disappearwith temperature and pressure exceeding a critical point. Thesupercritical fluid has high solubility, a high diffusion coefficient,low viscosity, and low surface tension. The supercritical fluid issimilar to gas in terms of diffusivity, and thus may infiltrate into afine groove because the supercritical fluid has no surface tension. Inaddition, the solubility of the supercritical fluid increases inproportion to pressure and the supercritical fluid is similar to liquidsolvent in terms of solubility. Thus, when the supercritical fluid isused, a cleaning liquid or a rinsing liquid on the substrate W may bedried without passing through the interface between gas and liquid,thereby suppressing a leaning phenomenon or water spot generation on thesubstrate W.

In some embodiments, the supercritical fluid may include carbon dioxide.The carbon dioxide has a low critical temperature of about 31° C. and alow critical pressure of about 73 atm and is non-toxic, non-flammable,and relatively inexpensive, so that the carbon dioxide may be easilyused for the drying treatment of the substrate W.

The vessel 110 may include an upper vessel 110U, a lower vessel 110L, alift member 120, a first supply port 111, a second supply port 113, andan exhaust port 115.

The upper vessel 110U and the lower vessel 110L may be coupled to eachother to be openable and closable to switch between a closed positionfor sealing the processing space PS and an open position for opening theprocessing space PS to the atmosphere. In some embodiments, the lowervessel 110L forms a space having an opened upper portion, and the uppervessel 110U may be coupled to the lower vessel 110L to cover the spaceof the lower vessel 110L. In this case, the upper vessel 110U maygenerally form an upper wall of the vessel 110, and the lower vessel110L may generally form a bottom wall and a side wall of the vessel 110.However, in other embodiments, the upper vessel 110U may generally forman upper wall and a side wall of the vessel 110, and the lower vessel110L may generally form a bottom wall of the vessel 110. Alternatively,the upper vessel 110U and the lower vessel 110L may form a side wall ofthe vessel 110 together.

The switching between the closed position and the open position of thevessel 110 may be performed by the lift member 120 and the drivingdevice 170, which will be described later. In some embodiments, whilethe vessel 110 is switched between the closed position and the openposition, the upper vessel 110U may be fixed and the lower vessel 110Lmay be lifted with respect to the fixed upper vessel 110U since thelower vessel 110L is positioned under the upper vessel 110U.

For example, as shown in FIG. 1A, when the lower vessel 110L descendsand is separated from the upper vessel 110U, the processing space PS isopened to the atmosphere. When the processing space PS is opened, thesubstrate W may be carried from the outside into the processing space PSor from the processing space PS to the outside of the vessel 110. Thesubstrate W carried into the processing space PS may be in a state wherean organic solvent remains through a cleaning process. In the openposition of the vessel 110, the upper vessel 110U and the lower vessel110L may face each other at a predetermined distance from each other.For example, the predetermined distance may be about 5 mm to about 20mm, but is not limited thereto.

As shown in FIG. 1B, when the lower vessel 110L ascends and comes intoclose contact with the upper vessel 110U, the processing space PS may besealed. When the processing space PS is sealed, a drying process for thesubstrate W, which uses the supercritical fluid, may be performed.

The lift member 120 may lift at least one of the upper vessel 110U andthe lower vessel 110L. In other words, at least one of the upper vessel110U and the lower vessel 110L may be lifted by the lift member 120 tobe switched between the closed position and the open position. The liftmember 120 may include a lifting cylinder 121 and a lifting rod 123. Thelifting cylinder 121 may be coupled to the lower vessel 110L. In orderto withstand a high pressure inside the processing space (PS) while adrying process for the substrate W is performed, the lifting cylinder121 may closely contact the upper vessel 110U and the lower vessel 110Lto seal the vessel 110.

The lifting rod 123 may be coupled to the upper vessel 110U and thelower vessel 110L, and vertically move or guide the upper vessel 110Uand/or the lower vessel 110L of the vessel 110 between open and closedpositions. For example, in some embodiments, one end of the lifting rod123 may be coupled to the lifting cylinder 121, and the other end may becoupled to the upper vessel 110U. When a driving force is generated bythe lifting cylinder 121, the lifting cylinder 121 and the lifting rod123 and the lower vessel 110L, coupled to the lifting cylinder 121, maybe lifted. The lifting rod 123 may guide the upper vessel 110U and/orthe lower vessel 110L in a vertical direction while the lower vessel110L is lifted by the lifting member 120, and may allow the upper vessel110U and/or the lower vessel 110L to remain horizontal.

The first supply port 111 is used to supply a supercritical fluid intothe vessel 110, and may be formed in the lower vessel 110L. For example,the first supply port 111 may be positioned below the center of thesubstrate W placed on the substrate support 130. The first supply port111 may be connected to the fluid supply unit 140 through a first supplyline 140La.

The second supply port 113 is used to supply a supercritical fluid intothe vessel 110, and may be formed in the upper vessel 110U. For example,the second supply port 113 may be positioned above the center of thesubstrate W placed on the substrate support 130. The second supply port113 may be connected to the fluid supply unit 140 through a secondsupply line 140Lb. In some embodiments, fluid for pressure control maybe supplied into the vessel 110 through the second supply port 113.

The exhaust port 115 is used to discharge a fluid from inside the vessel110, and may be formed in the lower vessel 110L. The exhaust port 115may be connected to the exhaust unit 141 through an exhaust line 141L.

The substrate support 130 may support the substrate W provided in theprocessing space PS. The substrate support 130 may support the substrateW such that a first side of the substrate W faces the bottom wall of thevessel 110 and a second side of the substrate W opposite to the firstside of the substrate W faces the upper wall of the vessel 110. In thiscase, the first side of the substrate W may be a pattern surface havinga pattern formed therein. Alternatively, the second side of thesubstrate W may be a pattern surface having a pattern formed therein.

The substrate support 130 may support the edge of the substrate W. Forexample, the substrate support 130 may have a bent structure thatextends vertically downward from the upper vessel 110U and extends in ahorizontal direction again. The substrate support 130 may be installedin the fixed upper vessel 110U and stably support the substrate W whilethe lower vessel 110L is lifted.

The fluid supply 140 may supply a supercritical fluid into the vessel110. The first supply line 140La for providing a supercritical fluidflow path may be connected to the first supply port 111 formed in thebottom wall of the vessel 110, and the fluid supply unit 140 may supplya supercritical fluid to the first side of the substrate W, supported bythe substrate support 130, through the first supply line 140La and thefirst supply port 111. In addition, the second supply line 140Lb forproviding a supercritical fluid flow path may be connected to the secondsupply port 113 formed in the upper wall of the vessel 110, and thefluid supply unit 140 may supply a supercritical fluid to the secondside of the substrate W, supported by the substrate support 130, throughthe second supply line 140Lb and the second supply port 113.

The exhaust unit 141 may discharge a fluid inside the vessel 110. Theexhaust line 141L for providing a flow path may be connected to theexhaust port 115, and the exhaust unit 141 may discharge the fluidinside the vessel 110 through the exhaust port 115 and the exhaust line141L.

The barrier 150 may be provided in the vessel 110 to prevent particlesin the vessel 110 from entering the substrate W supported by thesubstrate support 130. The barrier 150 may be arranged between thesubstrate support 130 and the side wall of the vessel 110 to preventparticles generated by the opening and closing of the vessel 110 fromcorrupting the substrate W.

For example, as shown in FIG. 1B, the barrier 150 may prevent particles,generated from a contact portion (refer to 119 a and 119 b in FIG. 5)where the upper vessel 110U and the lower vessel 110L contact eachother, from being transferred to the substrate W when the vessel 110 isopened or closed. The barrier 150 may guide particles generated aroundthe contact portion away from the substrate W to a lower portion of thevessel 110 where the exhaust port 115 is formed, and thus may preventparticles from corrupting the substrate W supported by the substratesupport 130. In some embodiments of the inventive concept, the barrier150 is configured to block a line of sight between the contact portionand the substrate support 130 and/or the substrate W when the vessel 110is in the open or in the closed position. In further embodiments, of theinventive concept, the contact portion may include two opposing facesthat are exposed when the vessel 110 is in the open position and are incontact to cover the contact portion when the vessel 110 is in theclosed position.

The barrier 150 may be arranged on the upper wall of the vessel 110, forexample, the lower surface of the upper vessel 110U, and may extend fromthe lower surface of the upper vessel 110U downward. For example, thebarrier 150 may extend from the lower surface of the upper vessel 110Udownward along the side wall of the vessel 110.

In some embodiments, the barrier 150 may extend downward from the lowersurface of the upper vessel 110U to a point lower than the contactportion. In some embodiments, the barrier 150 may extend downward fromthe lower surface of the upper vessel 110U to a point lower than thesubstrate W supported by the substrate support 130.

In some embodiments, the barrier 150 may extend along the edge of thesubstrate W supported by the substrate support 130, and may have, forexample, a ring shape. Alternatively, the barrier 150 may extend in acircumferential direction along the side wall of the vessel 110, and mayhave, for example, a ring shape.

The blocking plate 160 may block direct spray of a supercritical fluidsupplied through the fluid supply unit 140 onto the substrate W. Forexample, the blocking plate 160 may be arranged between the first supplyport 111 and the substrate support 130, and thus, a supercritical fluidsprayed from the first supply port 111 may be prevented from beingdirectly sprayed onto the substrate W supported by the substrate support130. For example, a supercritical fluid sprayed from the first supplyport 111 and reaching the blocking plate 160 may move along the surfaceof the blocking plate 160 and then may reach the substrate W supportedby the substrate support 130.

The blocking plate 160 may have a shape corresponding to the substrateW, and may have, for example, a disc shape. The blocking plate 160 mayhave a radius equal to or greater than the radius of the substrate W toeffectively block the direct spray of a supercritical fluid onto thesubstrate W. Alternatively, the blocking plate 160 may have a smallerradius than the substrate W so that a supercritical fluid may relativelyeasily reach the substrate W.

In some embodiments, the blocking plate 160 may be arranged on the lowervessel 110L and may be spaced apart from the surface of the lower vessel110L by a predetermined distance by a support 161. The first supply port111 and/or the exhaust port 115 formed in the lower vessel 110L mayvertically overlap the blocking plate 160. In this case, the blockingplate 160 may allow a supercritical fluid sprayed from the first supplyport 111 to reach the substrate W, supported by the substrate support130, with a predetermined stream along the surface of the blocking plate160. The blocking plate 160 may also allow the fluid in the vessel 110to exit through the exhaust port 115 with a predetermined, streamleading to the exhaust port 115 along the surface of the blocking plate160.

The driving device 170 may adjust the switching between the closedposition and the open position of the vessel 110. The driving device 170may apply a driving force to the lift member 120 to drive the liftmember 120 installed on the vessel 110. For example, the driving device170 may be a hydraulic driving device and may include a control devicesuch as a hydraulic pump for generating hydraulic pressure and aregulator. The driving device 170 may be connected to the liftingcylinder 121 through a hydraulic pressure transmission line 170L, and ahydraulic pressure regulating valve may be installed in the hydraulicpressure transmission line 170L.

FIGS. 2 and 3 are cross-sectional views schematically showing substrateprocessing apparatuses 100 a and 100 b, respectively, according toembodiments. FIGS. 2 and 3 show the substrate processing apparatuses 100a and 100 b in a closed position, and the substrate processingapparatuses 100 a and 100 b shown in FIGS. 2 and 3 may havesubstantially the same configuration as the substrate processingapparatus 100 shown in FIGS. 1A and 1B except that the substrateprocessing apparatuses 100 a and 100 b further include guide pins 151and 151 a, respectively.

Referring to FIGS. 2 and 3, the substrate processing apparatuses 100 aand 100 b may include a barrier 150 for preventing particles in a vessel110 from entering a substrate W supported by a substrate support 130,and may further include the guide pins 151 and 151 a, provided in thevessel 110, in contact with and to support the barrier 150.

The guide pins 151 and 151 a may be in contact with and support thebarrier 150 during a drying process for the substrate W. For example,when the vessel 110 is in a closed position to perform a drying process,the guide pins 151 and 151 a may function to guide the barrier 150 to bepositioned at a predetermined position. Also, the guide pins 151 and 151a may mitigate the vibration of the barrier 150 due to a pressure pulseor the like applied in the vessel 110 by contacting and supporting thebarrier 150 during a drying process.

In some embodiments, the guide pin 151 may be in contact with andsupport the side of the barrier 150, as shown in FIG. 2. For example,the guide pin 151 may be arranged on a side wall of a lower vessel 110L.

In some embodiments, the guide pin 151 a may be in contact with andsupport a lower portion of the barrier 150, as shown in FIG. 3. Forexample, the guide pin 151 a may be arranged on a bottom wall of thevessel 110, e.g., a bottom wall of the lower vessel 110L.

Although FIGS. 2 and 3 show examples in which there is one guide pin 151or 151 a, the inventive concept is not limited thereto. In someembodiments, a plurality of guide pins 151 and 151 a may be arrangedalong a circumferential direction of the barrier 150.

FIG. 4 is a cross-sectional view schematically showing a substrateprocessing apparatus 100 c according to embodiments. FIG. 4 shows thesubstrate processing apparatus 100 c in a closed position, and thesubstrate processing apparatus 100 c shown in FIG. 4 may havesubstantially the same configuration as the substrate processingapparatus 100 shown in FIGS. 1A and 1B except for the structure of abarrier 150 a.

Referring to FIG. 4, the substrate processing apparatus 100 c mayinclude the barrier 150 a for preventing particles in a vessel 110 fromentering a substrate W supported by a substrate support 130, and thebarrier 150 a may have a shape in which a lower portion thereof isinwardly curved or bent away from the side wall of the lower vessel110L.

Specifically, the barrier 150 a may be coupled to an upper vessel 110Uand extend downward from the upper vessel 110U toward the lower vessel110L, and the lower portion of the barrier 150 a may have an inwardlycurved or bent shape. For example, in a ring-shaped barrier 150 a, thelower portion of the barrier 150 a may have a shape that graduallydecreases downward.

With the above-described configuration, a distance between the barrier150 a and the side wall of the vessel 110 is increased near the lowerportion of the barrier 150 a, and thus, the pressure in the vicinity ofthe lower portion of the barrier 150 a locally increases. Accordingly,particles generated in a contact portion (refer to 119 a and 119 b inFIG. 5) where the upper vessel 110U and the lower vessel 110L contacteach other in a closed position may move downward more readily along thebarrier 150 a.

FIGS. 5 and 6 are cross-sectional views schematically showing substrateprocessing apparatuses 100 d and 100 e according to embodiments, whichshow a portion corresponding to a region A in FIG. 1A. The substrateprocessing apparatuses 100 d and 100 e shown in FIGS. 5 and 6 may havesubstantially the same configuration as the substrate processingapparatus 100 shown in FIGS. 1A and 1B except that the substrateprocessing apparatuses 100 d and 100 e further include a firstprotective layer 181 and/or a second protective layer 183.

Referring to FIG. 5, the substrate processing apparatus 100 d mayinclude the first protective layer 181 for preventing generation ofparticles due to friction between an upper vessel 110U and a lowervessel 110L.

The upper vessel 110U and the lower vessel 110L may be coupled to eachother to be openable and closable to switch between a closed positionfor sealing a processing space PS and an open position for opening theprocessing space PS, and a vessel (refer to 110 in FIG. 1A) may havecontact portions 119 a and 119 b where the upper vessel 110U and thelower vessel 110L contact in the closed position. That is, the contactportions 119 a and 119 b are regions where the upper vessel 110U and thelower vessel 110L contact each other in the closed position, and maydenote a portion of the surface of the upper vessel 110U and a portionof the surface of the lower vessel 110L. The contact portions 119 a and119 b are parts where repetitive friction occurs during a dryingprocess, and abrasion may occur in the upper vessel 110U and the lowervessel 110L due to the friction at the contact portions 119 a and 119 b.

The first protective layer 181 may include an upper protective layer 181a formed on the contact portion 119 a on a portion of the surface of theupper vessel 110U and a lower protective layer 181 b formed on thecontact portion 119 b on a portion of the surface of the lower vessel110L. In some embodiments, the first protective layer 181 may include atleast one of the upper protective layer 181 a and the lower protectivelayer 181 b. For example, the first protective layer 181 may includeonly one of the upper protective layer 181 a and the lower protectivelayer 181 b.

The first protective layer 181 may reduce friction between the uppervessel 110U and the lower vessel 110L, caused by switching between theclosed position and the open position, and may reduce generation ofparticles which may occur due to the friction. Particularly, the contactportions 119 a and 119 b are places where repetitive friction occurswhen a pressure pulse is applied to the inside of the vessel 110 while adrying process is performed. The first protection layer 181 may preventabrasion of the vessel 110 due to repetitive friction between the uppervessel 110U and the lower vessel 110L and may prevent generation ofmetallic particles due to the abrasion of the vessel 110.

The first protective layer 181 may include a material having lowdeformation at high pressure and having a low friction coefficient. Insome embodiments, the first protective layer 181 may include a materialhaving a friction coefficient less than about 0.5. Also, in someembodiments, the first protective layer 181 may include a resin-basedmaterial. For example, the first protective layer 181 may includepolyimide (PI), polytetrafluoroethylene (PTFE), polychlorotrifluoroethyl(PCTFE), or a combination thereof.

In some embodiments, the first protective layer 181 may be formed on thecontact portions 119 a and 119 b by a spray method. Alternatively, inother embodiments, the first protective layer 181 may be provided in afilm shape and attached to the contact portions 119 a and 119 b.Furthermore, in order to form the first protective layer 181, anadditional process for improving a contact force with the vessel 110and/or an additional process for improving physical and chemicalproperties such as heat resistance, pressure resistance, and chemicalresistance properties may be performed. In some embodiments, before thefirst protective layer 181 is formed on the contact portions 119 a and119 b, electropolishing may be performed on the contact portions 119 aand 119 b to remove impurities on the surfaces of the contact portions119 a and 119 b and flatten the surfaces of the contact portions 119 aand 119 b.

The first protective layer 181 may have a thickness in the range ofseveral micrometers (μm) to several hundreds of millimetres (mm) on thecontact portions 119 a and 119 b. For example, the first protectivelayer 181 may have a thickness between 1 μm and 10 μm, or may have athickness between 10 mm and 100 mm.

In some embodiments, the first protective layer 181 may be formed on aportion of the surface of the upper vessel 110U and/or a portion of thesurface of the lower vessel 110L, which constitute the contact portions119 a and 119 b. As the first protective layer 181 is formed on thecontact portions 119 a and 119 b where repetitive friction occurs, thenumber of particles generated due to the abrasion of the upper vessel110U and the lower vessel 110L may be significantly reduced.Accordingly, defects occurring in the substrate W as a result ofmetallic particles being transferred and adsorbed onto the substrate W,supported by the substrate support 130, during a drying process may bereduced. Particularly, defects occurring in an edge portion of thesubstrate W may be reduced.

Referring to FIG. 6, the substrate processing apparatus 100 e mayfurther include the second protective layer 183 formed on a lifting rod123 coupled to the upper vessel 110U and the lower vessel 110L tovertically guide the upper vessel 110U and/or the lower vessel 110L. Thesecond protective layer 183 may include a material similar to thematerial of the first protective layer 181 and may be formed in a mannersimilar to that of the first protective layer 181.

Since the lifting rod 123 performs a function of guiding the movement ofthe upper vessel 110U and/or the lower vessel 110L, particles generateddue to friction between the lifting rod 123 and the upper vessel 110Uand/or the lower vessel 110L may readily flow into the vessel 110. Inaddition, particles generated from the contact portions 119 a and 119 bmay be attached to the lifting rod 123, and particles attached to thelifting rod 123 may be detached due to repetitive friction and flow intothe vessel 110.

As the second protective layer 183 is formed on the surface of thelifting rod 123, friction between the lifting rod 123 and the uppervessel 110U and/or the lower vessel 110L may be reduced and the numberof particles generated due to the friction may be further reduced.

FIG. 7 is a diagram showing a stream S1 along which a fluid isdischarged from a vessel 110 in a closed position in a substrateprocessing apparatus 100 according to some embodiments.

Referring to FIG. 7, as described above, in the vicinity of contactportions (refer to 119 a and 119 b in FIG. 5) where an upper vessel 110Uand a lower vessel 110L contact each other, particles may be generateddue to abrasion of the upper vessel 110U and/or the lower vessel 110L.For example, the contact portions may be positioned near the edge of alower surface of the upper vessel 110U, and may be positioned on a sidewall of the vessel 110.

Since a barrier 150 is arranged between a substrate support 130 and aside wall of a vessel 110 and extends from the upper vessel 110Udownward, a fluid containing particles generated near contact portions119 a and 119 b may be guided by the barrier 150 and flow in a downwardstream S1. That is, the particles generated near the contact portions119 a and 119 b may move downward along the side walls of the barrier150 and the vessel 110. Subsequently, a fluid containing the particlesguided downward may be moved to the exhaust port 115 along the surfaceof the lower vessel 110L and be discharged from the exhaust port 115. Insome embodiments, while the fluid containing the particles moves to theexhaust port 115, the fluid containing the particles may move to theexhaust port 115 along a path provided between the blocking plate 160and the lower vessel 110L.

FIG. 8 is a diagram showing a stream S2 of a supercritical fluidsupplied into a vessel 110 in a substrate processing apparatus 100according to some embodiments.

Referring to FIG. 8, a barrier 150 may block the flow of a supercriticalfluid that is supplied near contact portions (refer to 119 a and 119 bin FIG. 5), i.e., between the barrier 150 and a side wall of the vessel110. For example, a supercritical fluid supplied through a second supplyport 113 may have the stream S2 that flows in a radial direction of asubstrate W along the substrate W supported by a substrate support 130,descends along the barrier 150 in the vicinity of the circumference ofthe substrate W, and then is discharged through the exhaust port 115.That is, the barrier 150 may block a supercritical fluid suppliedthrough the second supply port 113 from flowing directly to the contactportions 119 a and 119 b, and may prevent an irregular flow of thesupercritical fluid, for example, a turbulence flow of the supercriticalfluid, in the vicinity of the contact portions 119 a and 119 b while thesupercritical fluid flows directly to the vicinity of the contactportions 119 a and 119 b. Therefore, it is possible to prevent aphenomenon in which particles do not move to the exhaust port 115 due tothe turbulence generated near the contact portions 119 a and 119 b andstay near the contact portions 119 a and 119 b.

FIGS. 9 and 10 are views schematically showing substrate processingapparatuses 100 f and 100 g according to some embodiments, respectively.The substrate processing apparatuses 100 f and 100 g shown in FIGS. 9and 10 may have substantially the same configuration as the substrateprocessing apparatuses 100, 100 a, 100 b, 100 d, and 100 e describedabove except that each of the substrate processing apparatuses 100 f and100 g include a plurality of vessels 110.

Referring to FIGS. 9 and 10, each of the substrate processingapparatuses 100 f and 100 g may include the plurality of vessels 110,each of which provides a processing space in which a drying process fora substrate may be performed, and a driving device 170 coupled to eachof the plurality of vessels 110. One driving device 170 may be provided,or the number thereof may be less than the number of the plurality ofvessels 110. The driving device 170 may be positioned above, below, orbeside the plurality of vessels 110.

In some embodiments, as shown in FIG. 9, the plurality of vessels 110may be arranged in series, for example, in a form in which the vessels110 are stacked. Switching between a closed position and an openposition of each of the plurality of vessels 110 may be performed and/orcontrolled by one driving device 170. That is, the driving device 170may apply a driving force, for example, a hydraulic pressure, forswitching between the closed position and the open position to each ofthe plurality of vessels 110. In some embodiments, the driving device170 may control the driving of the plurality of vessels 110 such thatthe switching between the closed position and the open position isperformed simultaneously in each of the plurality of vessels 110, or maycontrol the driving of the plurality of vessels 110 such that theswitching between the closed position and the open position is performedseparately in each of the plurality of vessels 110.

In some embodiments, as shown in FIG. 10, the substrate processingapparatus 100 g may include a plurality of vessels 110 arranged inparallel and a driving device 170 connected to each of the plurality ofvessels 110. For example, the plurality of vessels 110 may be arrangedside-by-side.

Since each of the substrate processing apparatuses 100 f and 100 gincludes a plurality of vessels 110 that are driven by one drivingdevice 170, more vessels 110 per area may be used for a drying process,and thus, process productivity may be further improved. For example, aunit per equipment hour (UPEH) may be further improved.

FIG. 11 is a plan view schematically showing an integrated circuitdevice manufacturing apparatus 1000 according to some embodiments. InFIG. 11, the same reference numerals as those in FIGS. 1A and 1B denotethe same elements as those in FIGS. 1A and 1B, and detailed descriptionsthereof will be omitted.

Referring to FIG. 11, the integrated circuit device manufacturingapparatus 1000 includes an index module 1010, a buffer unit 1020, acleaning unit 1030, a drying unit 1040, and a conveying unit 1050.

The index module 1010 includes a load port 1012 and a transfer frame1014.

A carrier CA accommodating a substrate W is placed in the load port1012. The index module 1010 may include a plurality of load ports 1012,but is not limited thereto. The number of load ports 1012 may bevariously determined according to the process efficiency and the processcontrol condition of the integrated circuit device manufacturingapparatus 1000. For example, a front opening unified pod (FOUP) may beused as the carrier CA.

An index rail 1016 and an index robot 1018 may be provided in thetransfer frame 1014. The transfer frame 1014 may convey the substrate Wbetween the carrier CA placed on the load port 1012 and the conveyingunit 1050.

In some embodiments, the substrate W may be a wafer, for example, asilicon wafer. In some other embodiments, the substrate W may be a glasssubstrate W. Patterns having a large aspect ratio may be formed on thesubstrate W.

The buffer unit 1020 may be arranged between the transfer frame 1014 andthe conveying unit 1050. The buffer unit 1020 provides a space in whichthe substrate W stays before the substrate W is conveyed between theconveying unit 1050 and the transfer frame 1014. A surface of the bufferunit 1020, which faces the transfer frame 1014, and a surface of thebuffer unit 1020, which faces the conveying unit 1050, may be opened.

The cleaning unit 1030 may be configured to supply a treatment liquid tothe substrate W to perform a predetermined wet cleaning.

The cleaning unit 1030 includes at least one wet treatment apparatus1032 for supplying a treatment liquid to the substrate W to perform awet processing. Although FIG. 11 illustrates a case where two wettreatment apparatuses 1032 are included in the cleaning unit 1030, butthe inventive concept is not limited thereto.

In the cleaning unit 1030, a wet cleaning may be performed by supplyinga treatment liquid to the substrate W. After the cleaning treatment ofthe substrate W, a rinsing treatment may be performed with a rinsingliquid, for example, deionized water or isopropyl alcohol. Whenisopropyl alcohol is used as the rinsing liquid, reactivity with asupercritical fluid used in a subsequent drying treatment, for example,supercritical carbon dioxide, is high and thus, the isopropyl alcoholmay be easily removed.

In addition, after the rinsing treatment, an additional wettingtreatment may be performed using a wetting liquid containing an organicsolvent having a higher affinity for carbon dioxide than deionizedwater, in order to promote a subsequent drying treatment using asupercritical fluid. When a surfactant is added to a rinsing liquid,vapor pressure is lowered because the interaction between a liquid phaseand a gaseous phase is weakened. Therefore, when the substrate W isconveyed from the cleaning unit 1030 to the drying unit 1040 in a statewhere a wetting liquid containing a surfactant is present on thesubstrate W, a natural drying of the substrate W may be suppressed. Asthe surfactant, a material which may be dissolved well in a wettingliquid and may be dissolved well in a supercritical fluid such assupercritical carbon dioxide may be used. The surfactant may include atleast one of a trimethyl nonanol (TMN) surfactant, a fluorinatedsurfactant having a branch, and a surfactant including a fluorinatedblock copolymer.

The conveying unit 1050 may take out the substrate W cleaned by thecleaning unit 1030, supply an anti-drying liquid to the cleanedsubstrate W, and convey the substrate W in a wet state to the dryingunit 1040. The conveying unit 1050 may include a conveying member 1054for supporting the substrate W and a wet conveying unit 1056 forsupplying an anti-drying liquid to the substrate W. The conveying member1054 may take out the substrate W from the cleaning unit 1030 and conveythe substrate W, taken out from the cleaning unit 1030, to the dryingunit 1040.

In the conveying unit 1050, the wet conveying unit 1056 may spray, onthe substrate W, a wetting liquid for preventing drying. Isopropylalcohol may be used as the wetting liquid for preventing drying, but isnot limited thereto. It is possible to prevent the natural drying of arinsing liquid on the substrate W by supplying a wetting liquid forpreventing drying to the substrate W after the cleaning and rinsingprocess of the substrate W.

In this way, since the natural drying of a rinsing liquid on thesubstrate W is prevented by supplying a wetting liquid for preventingdrying to the substrate W when the substrate W is conveyed from thecleaning unit 1030 to the drying unit 1040, a leaning phenomenon, inwhich patterns formed on the substrate W are inclined due to surfacetension between gas and liquid even if the aspect ratio of the patternsis relatively large when the substrate W is dried in the drying unit1040, may be suppressed. In addition, when a substrate W with patternshaving a relatively large aspect ratio is wet-cleaned and then is driedusing a supercritical fluid in a state in which a natural drying issuppressed, the generation of a water spot on the substrate W may besuppressed.

The drying unit 1040 may dry the substrate W that has undergone cleaningand rinsing processes in the cleaning unit 1030. The drying unit 1040 isconfigured to dry the substrate W by using a supercritical fluid. In thedrying unit 1040, the substrate W is dried using the low viscosity andsurface tension of the supercritical fluid. The drying unit 1040 may bearranged separately from the cleaning unit 1030.

The drying unit 1040 includes at least one drying chamber 1042 fordrying the substrate W. FIG. 11 illustrates that two drying chambers1042 are included in the drying unit 1040. However, the inventiveconcept is not limited thereto, and the number of drying chambers 1042may be determined as necessary. The drying chamber 1042 may beconfigured with any one of the substrate processing apparatuses 100, 100a, 100 b, 100 d, 100 e, 100 f, and 100 g described with reference toFIGS. 1A to 6, 9, and 10, or with a substrate processing apparatushaving a structure modified and changed according to the scope of theinventive concept from the substrate processing apparatuses 100, 100 a,100 b, 100 d, 100 e, 100 f, and 100 g.

FIG. 12 is a flowchart for explaining a substrate processing methodaccording to embodiments. FIG. 13 is a graph showing an exemplarypressure change in a processing space PS of a vessel 110 in an operationof drying a substrate of FIG. 12.

Referring to FIGS. 12 and 13 together with FIGS. 1A and 1B, thesubstrate W is loaded into the processing space PS of the vessel 110(Operation S110). The vessel 110 may be placed in an open position whilethe substrate W is being loaded into the processing space PS, and thesubstrate W may be supported by the substrate support 130 in theprocessing space PS.

Subsequently, the substrate W is dried using a supercritical fluid inthe processing space PS of the vessel 110 (Operation S120). During adrying process for the substrate W, the vessel 110 may be placed in aclosed position to seal the processing space PS. The sealed state of theprocessing space PS may be maintained by the lift member 120 and thedriving device 170.

After the substrate W is loaded into the processing space PS of thevessel 110 to dry the substrate W, the pressure in the processing spacePS may be increased from an initial pressure P0, which is similar toatmospheric pressure, to a first pressure P1 by making a fluid such ascarbon dioxide to flow into the processing space PS of the vessel 110through the first supply port 111, at the closed position of the vessel110 as illustrated in FIG. 1B (Operation S121). A fluid may be suppliedinto the processing space PS of the vessel 110 through the first supplyport 111 until a fluid in the processing space PS of the vessel 110reaches a saturated vapor pressure or a critical pressure. After thefluid in the processing space PS of the vessel 110 reaches thesaturation vapor pressure, the temperature in the processing space PS ofthe vessel 110 may be raised to a temperature equal to or greater than acritical temperature of the fluid in the processing space PS. When thetemperature in the processing space PS of the vessel 110 reaches acritical temperature of the supplied fluid, the fluid in the processingspace PS of the vessel 110 may be in a supercritical state.

Thereafter, during a drying process for the substrate W using asupercritical fluid in the processing space PS, a depressurizationprocess and a pressure boosting process may be alternately repeated atleast twice to apply a pressure pulse to the wafer W (Operation S123).The depressurization process is a process of adjusting the supply flowrate of the supercritical fluid supplied in the processing space PS sothat the pressure in the processing space PS is reduced from the firstpressure P1 to a second pressure P2 lower than the first pressure P1.The pressure boosting process is a process of boosting the pressure inthe processing space PS from the second pressure P2 to the firstpressure P1 again.

In some embodiments, the first pressure P1 may be about 140 bar and thesecond pressure P2 may be about 100 bar. However, the inventive conceptis not limited thereto.

In order to alternately repeat the depressurization process and thepressure boosting process between the first pressure P1 and the secondpressure P2, as in Operation S123, a process of supplying apredetermined amount of pressure control fluid into the processing spacePS of the vessel 110 through the second supply port 113 as illustratedin FIG. 1A and a process of discharging gas in the processing space PSof the vessel 110 through the exhaust port 115 may be alternatelyrepeated.

After the drying process for the substrate W loaded in the processingspace PS of the vessel 110 is completed, a low-speed exhaust process(Operation S125) of lowering the pressure in the processing space PS ofthe vessel 110 to a third pressure P3, and a high-speed exhaust process(Operation S127) of lowering the pressure in the processing space PS ofthe vessel 110 to an initial pressure PO similar to the atmosphericpressure may be sequentially performed. The low-speed exhaust process(Operation S125) and the high-speed exhaust process (Operation S127) maybe controlled by controlling an exhaust flow rate through the exhaustport 115.

Next, when the drying process for the substrate W is completed, thedried substrate W is removed from the processing space PS (OperationS130). In order to remove the substrate W from the processing space PS,the vessel 110 may be switched from the closed position to the openposition.

According to the substrate processing method according to theembodiments, since the substrate processing apparatus 100 includes thebarrier 150, the substrate processing apparatus 100 may preventparticles generated due to the friction between the upper vessel 110Uand the lower vessel 110L from flowing into the substrate W during adrying process using a supercritical fluid, and may effectivelydischarge the particles to the exhaust port 115. In addition, since aprotective layer (refer to 181 in FIG. 5) is formed on contact portions(refer to 119 a and 119 b in FIG. 5) of the upper vessel 110U and thelower vessel 110L, the generation of particles due to abrasion of theupper vessel 110U and the lower vessel 110L may be suppressed while apressure pulse is applied to the inside of the vessel 110 as inOperation S123.

According to the substrate processing method according to theembodiments, a drying process may be performed in each of the pluralityof vessels 110 and the switching between a closed position and an openposition of each of the plurality of vessels 110 may be controlled byone driving device 190, and thus, the productivity of the drying processmay be improved.

While the inventive concept has been particularly shown and describedwith reference to embodiments thereof, it will be understood thatvarious changes in form and details may be made therein withoutdeparting from the spirit and scope of the following claims.

1. A substrate processing apparatus comprising: a vessel comprising aprocessing space for processing a substrate; a substrate supportconfigured to support the substrate loaded in the processing space; anda barrier, between a side wall of the vessel and the substrate support,configured to surround the substrate support.
 2. The substrateprocessing apparatus of claim 1, further comprising at least one guidepin in the processing space to contact and support the barrier.
 3. Thesubstrate processing apparatus of claim 1, wherein the barrier has aring shape and extends in a direction of an edge of the substratesupported by the substrate support.
 4. The substrate processingapparatus of claim 1, wherein the vessel comprises an upper vessel and alower vessel coupled to each other so as to be openable and closable toswitch between a closed position for sealing the processing space and anopen position for opening the processing space.
 5. The substrateprocessing apparatus of claim 4, wherein the substrate support and thebarrier are coupled to the upper vessel, wherein the barrier extendsdownward from the upper vessel to a point lower than the substratesupported by the substrate support.
 6. The substrate processingapparatus of claim 5, wherein a lower portion of the barrier is shapedso as to be bent inward away from the side wall of the vessel.
 7. Thesubstrate processing apparatus of claim 4, wherein the vessel comprisesa contact portion where the upper vessel and the lower vessel contacteach other in the closed position, and the substrate processingapparatus further comprises a first protective layer on the contactportion.
 8. The substrate processing apparatus of claim 7, wherein thefirst protective layer is on at least one of a portion of a surface ofthe upper vessel and a portion of a surface of the lower vessel, whereinthe portions of the surfaces of the upper and lower vessels constitutethe contact portion.
 9. The substrate processing apparatus of claim 4,wherein the vessel comprises a lifting rod coupled to the upper vesseland the lower vessel to guide at least one of the upper vessel and thelower vessel between the closed position and the open position, and thesubstrate processing apparatus further comprises a second protectivelayer on the lifting rod.
 10. The substrate processing apparatus ofclaim 4, wherein the vessel comprises: a first supply port in the lowervessel to supply a supercritical fluid into the vessel; a second supplyport in the upper vessel to supply a supercritical fluid into thevessel; and an exhaust port in the lower vessel to discharge a fluidfrom inside the vessel.
 11. (canceled)
 12. A substrate processingapparatus comprising: at least one vessel comprising a processing spaceconfigured to process a substrate, wherein the at least one vesselcomprises an upper vessel and a lower vessel moveably coupled to eachother so as to be openable and closable to switch between a closedposition for sealing the processing space and an open position foropening the processing space; a substrate support configured to supportthe substrate loaded in the processing space, wherein the substratesupport is coupled to an upper wall of the at least one vessel; abarrier between a side wall of the at least one vessel and the substratesupport, wherein the barrier is coupled to the upper wall defining theprocessing space of the at least one vessel; and an exhaust port in abottom wall of the at least one vessel opposite the upper wall andconfigured to discharge a fluid from inside the at least one vessel,wherein the barrier extends downward along a direction of the side wallof the at least one vessel toward the bottom wall, and wherein a lowestportion of the barrier extends past a lowest portion of the substratesupport from the upper wall when the vessel is in the closed position.13. The substrate processing apparatus of claim 12, further comprising adriving device moving at least one of the upper vessel and the lowervessel to the closed position or the open position.
 14. The substrateprocessing apparatus of claim 13, wherein the at least one vesselcomprises a plurality of vessels arranged in parallel, wherein thedriving device is connected to each of the plurality of vessels.
 15. Thesubstrate processing apparatus of claim 13, wherein the at least onevessel comprises a plurality of vessels stacked together, and thedriving device is connected to each of the plurality of vessels. 16.(canceled)
 17. The substrate processing apparatus of claim 12, furthercomprising at least one guide pin to contact and support a side orbottom of the barrier when the at least one vessel is in the closedposition.
 18. The substrate processing apparatus of claim 12, whereinthe at least one vessel comprises: a contact portion where the uppervessel and the lower vessel contact each other in the closed position;and a lifting rod coupled to the upper vessel and the lower vessel toguide at least one of the upper vessel and the lower vessel between theclosed position and the open position, wherein the substrate processingapparatus further comprises a first protective layer on the contactportion and a second protective layer on the lifting rod. 19.-22.(canceled)
 23. An apparatus for manufacturing an integrated circuitdevice, wherein the apparatus comprises: a cleaning unit configured toclean a substrate; and a drying unit comprising a drying chamber fordrying the cleaned substrate, wherein the drying chamber comprises: avessel comprising a processing space configured to process the cleanedsubstrate, wherein the vessel comprises an upper vessel and a lowervessel coupled to each other so as to be openable and closable to switchbetween a closed position to seal the processing space and an openposition to open the processing space; a substrate support configured tosupport the substrate loaded in the processing space, wherein thesubstrate support is coupled to the upper vessel; a barrier coupled tothe upper vessel to surround an edge of the substrate supported by thesubstrate support; and a driving device configured to move at least oneof the upper vessel and the lower vessel to the closed position or theopen position.
 24. The apparatus of claim 23, wherein the vesselcomprises a contact portion where the upper vessel and the lower vesselcontact each other in the closed position, and wherein the apparatusfurther comprises a protective layer on at least one of a portion of asurface of the upper vessel and a portion of a surface of the lowervessel, wherein the portions of the surfaces of the upper and lowervessels constitute the contact portion.
 25. The apparatus of claim 23,wherein the barrier extends downward from a lower surface of the uppervessel along a direction of a side wall of the lower vessel.
 26. Theapparatus of claim 23, wherein the drying chamber comprises a pluralityof vessels, and wherein the driving device is connected to the pluralityof vessels and controls switching between the closed position and theopen position of each of the plurality of vessels.
 27. (canceled)